发明名称 PRODUCTION METHOD OF GLASS SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a production method of a glass substrate being easily melted even when the glass has high viscosity at high temperature, and with which occurrence of a bubble defect on the glass substrate is suppressed.SOLUTION: In a production method of a glass substrate, with which a glass raw material including a silicon source and a boron source is compounded, melted, and molded, silica sand having a median particle diameter Dof 20-80μm and particle size distribution in which a mass ratio of particles with particle diameters of less than 25μm is less than 60%, and a mass ratio of particles with particle diameters of 150μm or more is less than 5% is used as the silicon source, and a substance which includes boric acid including at least one of orthoboric acid, metaboric acid, and tetraboric acid with a mass ratio of 80-95% based on the total boron source, is used as the boron source.</p>
申请公布号 JP2014240332(A) 申请公布日期 2014.12.25
申请号 JP20130122339 申请日期 2013.06.11
申请人 NIPPON ELECTRIC GLASS CO LTD 发明人 KAWAMOTO TORU;HORIUCHI MASAHIRO;MIWA NOBUYOSHI
分类号 C03C1/02;C03B17/06;C03C3/091;C03C3/093 主分类号 C03C1/02
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