| 发明名称 |
PHOTO-CURABLE COMPOSITION FOR IMPRINTS, PATTERN FORMING METHOD AND PATTERN |
| 摘要 |
To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cm3 or larger;;Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity. |
| 申请公布号 |
US2014374884(A1) |
申请公布日期 |
2014.12.25 |
| 申请号 |
US201414483860 |
申请日期 |
2014.09.11 |
| 申请人 |
FUJIFILM Corporation |
发明人 |
KITAGAWA Hirotaka;YOSHIDA Masafumi |
| 分类号 |
C09D11/101;B05D5/00;H01L21/308;B29C59/16;H01L21/027;C08F220/18;B29C59/00 |
主分类号 |
C09D11/101 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator,
which has a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by formula 1 of 0.6 mmol/cm3 or larger;
Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity. formula 1 |
| 地址 |
Tokyo JP |
