PROCESS CHAMBER GAS FLOW IMPROVEMENTS

摘要

Embodiments of the present invention generally provide plasma etch process chamber improvements. An improved gas injection nozzle is provided for use at a central location of the lid of the chamber. The gas injection nozzle may be used in an existing plasma etch chamber and is configured to provide a series of conic gas flows across the surface of a substrate positioned within the chamber. In one embodiment, an improved exhaust kit for use in the plasma etch chamber is provided. The exhaust kit includes apparatus that may be used in an existing plasma etch chamber and is configured to provide annular flow of exhaust gases from the processing region of the chamber.

主权项

1. A process gas injection nozzle, comprising:
a backing member; a first tube coupled to the backing member; a second tube concentrically positioned within the first tube to form a first annular flow channel between the second tube and the first tube; and a first dispersion member coupled to the second tube such that a first annular gap is disposed between the first tube and the first dispersion member.