发明名称 METHODS AND APPARATUS FOR AN ISFET
摘要 An ISFET includes a control gate coupled to a floating gate in a CMOS device. The control gate, for example, a poly-to-well capacitor, is configured to receive a bias voltage and effect movement of a trapped charge between the control gate and the floating gate. The threshold voltage of the ISFET can therefore by trimmed to a predetermined value, thereby storing the trim information (the amount of trapped charge in the floating gate) within the ISFET itself.
申请公布号 US2014375370(A1) 申请公布日期 2014.12.25
申请号 US201414478149 申请日期 2014.09.05
申请人 PARRIS PATRICE M.;CHEN WEIZE;DE SOUZA RICHARD J.;HOQUE MD M.;MCKENNA JOHN M. 发明人 PARRIS PATRICE M.;CHEN WEIZE;DE SOUZA RICHARD J.;HOQUE MD M.;MCKENNA JOHN M.
分类号 G01N27/414;G05F1/575;H01L21/28;H01L29/66;H01L49/02 主分类号 G01N27/414
代理机构 代理人
主权项 1. A method of forming a CMOS ISFET, comprising: providing a substrate; forming a floating gate structure over the substrate; and forming a control gate structure communicatively coupled to the floating gate structure, such that the control gate is configured to receive a bias voltage and effect transfer of charge selectively between the floating gate structure and the control gate structure.
地址 PHOENIX AZ US