发明名称 |
METHODS AND APPARATUS FOR AN ISFET |
摘要 |
An ISFET includes a control gate coupled to a floating gate in a CMOS device. The control gate, for example, a poly-to-well capacitor, is configured to receive a bias voltage and effect movement of a trapped charge between the control gate and the floating gate. The threshold voltage of the ISFET can therefore by trimmed to a predetermined value, thereby storing the trim information (the amount of trapped charge in the floating gate) within the ISFET itself. |
申请公布号 |
US2014375370(A1) |
申请公布日期 |
2014.12.25 |
申请号 |
US201414478149 |
申请日期 |
2014.09.05 |
申请人 |
PARRIS PATRICE M.;CHEN WEIZE;DE SOUZA RICHARD J.;HOQUE MD M.;MCKENNA JOHN M. |
发明人 |
PARRIS PATRICE M.;CHEN WEIZE;DE SOUZA RICHARD J.;HOQUE MD M.;MCKENNA JOHN M. |
分类号 |
G01N27/414;G05F1/575;H01L21/28;H01L29/66;H01L49/02 |
主分类号 |
G01N27/414 |
代理机构 |
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代理人 |
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主权项 |
1. A method of forming a CMOS ISFET, comprising:
providing a substrate; forming a floating gate structure over the substrate; and forming a control gate structure communicatively coupled to the floating gate structure, such that the control gate is configured to receive a bias voltage and effect transfer of charge selectively between the floating gate structure and the control gate structure. |
地址 |
PHOENIX AZ US |