EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM

摘要

An extreme ultraviolet light generating system of the present invention may be provided with: a laser apparatus that supplies pulsed laser light to the inside of a chamber where EUV light is generated; a light shutter that is disposed on an optical path of the pulsed laser light; and a control unit that controls to open/close the light shutter on the basis of generation signals supplied from an external apparatus, said generation signals instructing generation of the EUV light.