| 摘要 |
The present invention relates to a deposition apparatus and a deposition method capable of preventing a particle from being introduced into a chamber in which a deposition process is performed, and preventing a deposition material moving toward a substrate from being unnecessarily spread into the chamber. The deposition apparatus according to the present invention comprises a chamber in which an internally loaded board is transferred, a source unit disposed in an upper portion of the chamber and jetting a deposition material to the interior of the chamber, a shielding cover disposed below the source unit and having an opening to secure a path of the deposition material moving toward the board, a board position detecting unit disposed within the chamber and detecting a position of the board, and at least one operating shutter disposed between the source unit and the board and opening and closing the opening according to positions of the board detected by the board position detecting unit. A clean class within the chamber is maintained to form a quality film and convenience of equipment maintenance can be provided. |
