发明名称 MOLD MANUFACTURING METHOD AND MANUFACTURING DEVICE
摘要 <p>Provided are a mold manufacturing method and a developing device optimal for implementing said method. This manufacturing method of a mold used in manufacture of display device members involves: a photosensitive resin film forming step for forming a photosensitive resin film by coating the metal surface of a mold substrate with a coating liquid containing a photosensitive resin and a light absorbing agent having an absorption maximum wavelength different from the exposure wavelength of the photosensitive resin; an exposure step for exposing a pattern on a photosensitive resin film; a developing step for using a developing solution to develop the photosensitive resin film where the pattern is exposed; and a development stopping step for stopping development of the photosensitive resin film. In the developing step, the exposure wavelength surface is irradiated with irradiation of a wavelength in the absorption wavelength range of the light absorbing agent such that the amount of light absorbed by the metal surface is less than the amount of light absorbed by the photosensitive resin film, and the timing of transition to the development stopping step is determined on the basis of the amount of reflected light.</p>
申请公布号 KR20140146055(A) 申请公布日期 2014.12.24
申请号 KR20147022817 申请日期 2013.03.14
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 FUJII TAKASHI
分类号 B29C33/38;B29D7/01;G02B1/10;G02B5/02 主分类号 B29C33/38
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