ELECTRICALLY CONDUCTING STRUCTURE, MANUFACTURING METHOD THEREFOR, ELECTRONIC DEVICE, AND MANUFACTURING METHOD THEREFOR

摘要

Openings (26a) are formed in an insulating film (26) being used as a formation site; vertical, parallel carbon nanotubes (CNTs) (23) are formed; tip sections of said CNTs (23) are inserted into the aforementioned openings (26a); and with the exception of the tip sections inserted into the openings (26a), the CNTs (23) are cleared away. This design makes it possible to form high-quality CNTs inside openings in a formation site without depending on the base material, yielding a desired electrically conducting structure that exhibits high reliability.