| 摘要 |
<p>The purpose of the present invention is to provide a linear source for an OLED deposition apparatus, which increases an allowable time for a disposition process with an increased amount of an evaporative disposition material and enables smooth vaporization of the disposition material by letting the disposition material be directly evaporated from an evaporation container to a substrate. The linear source for the OLED disposition apparatus of the present invention comprises: a disposition chamber (10) in which a disposition target substrate (S) is vertically loaded; and at least one source (20) which is installed in the disposition chamber (10) and evaporates the disposition material by heating for the disposition material to be vaporized toward the substrate (S). The source comprises a plurality of evaporation containers (110) which is stacked along the vertical direction and installed to be detached, and having an outlet port (111) which horizontally discharges the vaporized disposition material so that the disposition material is directed to the substrate (S) vertically loaded in the disposition chamber (10); and a heater installed at each of the evaporation containers (110) to heat the disposition material in the evaporation containers (110). The source of the present invention increases an allowable time for a disposition process by increasing an evaporative amount of a disposition material and enables smooth vaporization of the disposition material by allowing the disposition material to be directly vaporized from evaporation containers toward a substrate.</p> |
