| 摘要 |
A charged particle beam device is described. The charged particle beam device includes a charged particle beam source (12) for emitting a charged particle beam, and a switchable multi-aperture (26) for generating two or more beam bundles (21a, 21b) from the charged particle beam, wherein the switchable multi-aperture includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement (226) configured for individually blanking the two or more beam bundles; and a stopping aperture (227) for blocking beam bundles, which are blanked off by the beam blanker arrangement. The device further includes a control unit electrically connected to the beam blanker arrangement and configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens (18) configured for focusing the two or more beam bundles on a specimen (19) or wafer, wherein the two or more beam bundles are tilted with respect to the specimen or wafer depending on the position of each of the two or more beam bundles relative to an optical axis defined by the objective lens, and wherein the objective lens is configured for focusing the charged particle beam source, a virtual source provided by the charged particle beam source or a crossover. |
