发明名称 APPARATUS FOR REMOVING PARTICLES FROM A TWIN CHAMBER PROCESSING SYSTEM
摘要 <p>Embodiments of an apparatus for removing particles from a twin chamber processing system are provided herein. In some embodiments, an apparatus for removing particles from a twin chamber processing system includes a remote plasma system; and a plurality of conduits fluidly coupling the remote plasma system to each process chamber of a twin chamber processing system to provide a plasma to an exhaust volume of each process chamber, wherein each conduit of the plurality of conduits has an outlet disposed along a boundary of the respective exhaust volumes.</p>
申请公布号 WO2014204660(A1) 申请公布日期 2014.12.24
申请号 WO2014US41024 申请日期 2014.06.05
申请人 APPLIED MATERIALS, INC. 发明人 NGUYEN, ANDREW;CHO, TOM K.;RAMASWAMY, KARTIK;VISHWANATH, YOGANANDA SARODE
分类号 H01L21/302;H01L21/02;H01L21/205;H01L21/3065 主分类号 H01L21/302
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