发明名称 |
APPARATUS FOR REMOVING PARTICLES FROM A TWIN CHAMBER PROCESSING SYSTEM |
摘要 |
<p>Embodiments of an apparatus for removing particles from a twin chamber processing system are provided herein. In some embodiments, an apparatus for removing particles from a twin chamber processing system includes a remote plasma system; and a plurality of conduits fluidly coupling the remote plasma system to each process chamber of a twin chamber processing system to provide a plasma to an exhaust volume of each process chamber, wherein each conduit of the plurality of conduits has an outlet disposed along a boundary of the respective exhaust volumes.</p> |
申请公布号 |
WO2014204660(A1) |
申请公布日期 |
2014.12.24 |
申请号 |
WO2014US41024 |
申请日期 |
2014.06.05 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
NGUYEN, ANDREW;CHO, TOM K.;RAMASWAMY, KARTIK;VISHWANATH, YOGANANDA SARODE |
分类号 |
H01L21/302;H01L21/02;H01L21/205;H01L21/3065 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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