In-Ce-O SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

摘要

[Problem] To provide: an In-Ce-O sputtering target having a suppressed occurrence of abnormal discharges and nodules over the long term despite containing Ce at an atom ratio Ce/(In+Ce) of 0.16-0.40 and that obtains a high-refraction film; and a method for producing the In-Ce-O sputtering target. [Solution] The In-Ce-O sputtering target is configured from an In-Ce-O oxide sintered body having indium oxide as the primary component and containing cerium, and is used when producing a transparent electrically conductive film having an index of refraction of at least 2.1. The target is characterized by the Ce content being 0.16-0.40 in terms of the atom ratio Ce/(In+Ce) and cerium oxide particles having a particle size of no greater than 5 μm being dispersed in the In-Ce-O oxide sintered body.