| 摘要 |
<p>This exposure device comprises: a substrate retaining stage (110) which retains a substrate (W) and which is capable of shuttling and elevating; an exposure stage (320) which retains a mask plate (310) such that a mask pattern (M2) faces a photosensitive face (M1) of the substrate (W); a mask dust removal unit (120) which advances together with the substrate retaining stage (110) and which makes contact with the surface of the pattern face (M2) of the mask (310) by a force in a direction that presses against the pattern face (M2) (first direction force) and removes dust while rotating; and a substrate dust removal unit (210) which, by the advancing of the substrate retaining stage (110), makes contact with the photosensitive face (M1) of the substrate (W) by a force in a direction that presses against the photosensitive face (M1) of the substrate (W) (second direction force) and removes dust while rotating. With this exposure device, it is possible to simplify the overall mechanism of removing dust from the photosensitive face of a substrate and the surface of a mask, and to rapidly expose a large volume of substrates.</p> |
