发明名称 誘導プラズマアプリケータ、当該アプリケータを備える真空容器、当該真空容器を備える表面処理装置
摘要 An inductive plasma applicator comprises a ferromagnetic inductively coupled source and an electrode with a hole pattern centered with respect to the plasma source. Such plasma applicator provides an efficient energy transfer to the plasma. The plasma applicator is preferably manufactured using a technology for producing electrical circuits. The electrode and a coil of the ferromagnetic inductively coupled plasma source are metal track portions formed on an insulating substrate. For example, the plasma applicator is manufactured using printed circuit board technology.
申请公布号 JP5647218(B2) 申请公布日期 2014.12.24
申请号 JP20120501251 申请日期 2010.03.18
申请人 发明人
分类号 H05H1/46;C23C16/509;H01J37/36;H01L21/205;H01L21/304;H01L21/3065;H01L21/31 主分类号 H05H1/46
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