| 摘要 |
The present application relates to a method of manufacturing a base film, a stacked structure, or a planarizing film. In the present application, provided is a method of manufacturing a base film, a stacked structure or a planarizing film that can effectively manufacture a planarizing film having good functionality in terms of planarizing performance and the like, while having a thickness of about 10 ㎛ or less, about 8 ㎛ or less, about 7 ㎛ or less, about 6 ㎛ or less or about 5 ㎛ or less. According to the above, a planarizing film can be manufactured by easily drawing a material having planarizing functionality such as a PVA-based resin, while preventing tearing or curling during a drawing process. |
