摘要 |
<p>Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.</p> |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LO, KIN PONG;BRILLHART, PAUL;RAMACHANDRAN, BALASUBRAMANIAN;KUPPURAO, SATHEESH;REDFIELD, DANIEL;RANISH, JOSEPH M.;MACK, JAMES FRANCIS;PATALAY, KAILASH KIRAN;OLSEN, MICHAEL;FEIGEL, EDDIE;HALPIN, RICHARD;VETORINO, BRETT |