发明名称 CHEMICAL VAPOR DEPOSITION APPARATUS FOR HIGH-SPEED DEPOSITION AT AMBIENT TEMPERATURE WITH TUBE-TYPE FILTER TRAP, SYSTEM FOR REMOTELY CONTROLLING SAME, AND DEPOSITION METHOD USING SAME
摘要 <p>The present invention provides a chemical vapor deposition apparatus for high-speed deposition at an ambient temperature with a tube-type filter trap. The chemical vapor deposition apparatus for high-speed deposition includes: a heating unit including a vaporizing furnace in which a first heater is installed to vaporize a dimer material that is a chemical vapor deposition raw material into a dimer in a polymer state after the dimer material is fed into the vaporizing furnace, thereby reducing the volume and manufacturing costs of equipment, reducing a process time due to a continuous deposition process, and easily and efficiently managing equipment control by an end user and a pyrolysis furnace connected and installed on one side of the vaporizing furnace to supply the dimer and in which a second heater is installed to dissolve the dimer in the polymer state into a monomer in a unimolecular state; a vacuum deposition unit connected and installed on one side of the pyrolysis furnace of the heating unit and including a deposition chamber receiving an adherend therein and forming a vacuum deposition space so that a monomer unimolecular gas, which is supplied into the pyrolysis furnace, is deposited on a surface of the adherend, and a vacuum pump that is driven to generate vacuum within the deposition chamber; a filter trap coupled and installed on the vacuum deposition unit to mutually connect the vacuum pump to the deposition chamber and configured to deposit and extract the excessive monomer generated in the vacuum generation process using the vacuum pump and the deposition process; a measuring unit including a temperature sensor that is installed in each of the vaporizing furnace and the pyrolysis furnace to measure the temperature of each of the vaporizing furnace and the pyrolysis furnace, and a vacuum sensor installed in the deposition chamber to measure a vacuum value generated from the vacuum pump; a control box including a display window for displaying the temperature and vacuum value which are measured by the temperature sensor and the vacuum sensor of the measuring unit, and a plurality of power buttons for operating a first heater and second heater of the heating unit and applying a standby power and main power into the vacuum pump; and a control unit mounted in the control box to apply a control signal into each of the first heater, the second heater, and the vacuum pump according to the measurement signal inputted from the temperature sensor and vacuum sensor of the measuring unit, wherein the control unit is capable of setting reference values with respect to the temperature and vacuum values. The control unit controls a tube-type filter trap that preliminarily heats each of the first and second heaters to the preset temperature and maintains the preheated state when the standby power is applied to the control box.</p>
申请公布号 WO2014204078(A1) 申请公布日期 2014.12.24
申请号 WO2014KR00699 申请日期 2014.01.24
申请人 URI FINE PLATING CO.,LTD. 发明人 JANG, TAE-SOON
分类号 C23C16/44;C23C16/52 主分类号 C23C16/44
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