EUV actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating

摘要

An extreme ultraviolet (EUV) actinic reticle imaging system suitable for discharge produced plasma (DPP) or laser produced plasma (LPP) reticle imaging systems using a thin film coating spectral purity filter (SPF) positioned on or proximate to the EUV imaging sensor; an EUV imaging sensor carrying this SPF; and methods for making and using the SPF for reticle inspection. The coating may be applied to the imaging sensor in any manner suitable for the particular coating selected. The coating may be composed of a single layer or multiple layers. Typical SPF coating materials include zirconium (Zr) and silicon-zirconium (Si/Zr) in a thickness between 10 nm and 100 nm.

主权项

1. An extreme ultraviolet reticle inspection apparatus, comprising:
an extreme ultraviolet imaging sensor; and a thin film coating spectral purity filter having one or more selected spectral characteristics disposed on a back-thinned semiconductor substrate of the extreme ultraviolet imaging sensor imaging sensor, the extreme ultraviolet imaging sensor serving as a support structure for the thin film coating spectral purity filter.