发明名称 Structures and methods for RF de-embedding
摘要 Electrical structures, methods, and computer program products for radio frequency (RF) de-embedding are provided. A structure includes a first test device, a first through structure corresponding to the first test device, and a first open structure corresponding to the first test device. The structure also includes a second test device having at least one different physical dimension than the first test device but otherwise identical to the first test device, a second through structure corresponding to the second test device, and a second open structure corresponding to the second test device. A method includes determining a first electrical parameter of the first test device in a first DUT structure and a second electrical parameter of the second test device in a second DUT structure based on measured electrical parameters of the first and the second DUT structures, through structures, and open structures.
申请公布号 US8917083(B2) 申请公布日期 2014.12.23
申请号 US201012953810 申请日期 2010.11.24
申请人 International Business Machines Corporation 发明人 Groves Robert A.;Lu Ning;Putnam Christopher S.;Thompson Eric
分类号 G01R5/14;G01R27/28;H01L21/66;G01R35/00 主分类号 G01R5/14
代理机构 Roberts Mlotkowski Safran & Cole, P.C. 代理人 Cain David;Roberts Mlotkowski Safran & Cole, P.C.
主权项 1. A structure, comprising: a first set of test structures comprising: a first device under test (DUT) structure comprising a first capacitor having a first length;a first through structure corresponding to the first DUT structure; anda first open structure corresponding to the first DUT structure; and a second set of test structures comprising: a second device under test (DUT) structure comprising a second capacitor having a second length different than the first length but otherwise identical to the first capacitor;a second through structure corresponding to the second DUT structure; anda second open structure corresponding to the second DUT structure.
地址 Armonk NY US