Plasma generation device and plasma processing device

摘要

A flange, which forms a portion of a vacuum container, has a rectangular opening surrounded by an insulating frame. A plate-shaped radio-frequency antenna conductor 13 is provided so as to cover the opening, with the insulating frame clamped thereby. In this structure, a radio-frequency power source is connected via a matching box to one end along the length of the radio-frequency antenna conductor, the other end is connected to ground, and electric power is supplied so that a radio-frequency current flows from one end of the radio-frequency antenna conductor to the other. By this method, the impedance of the radio-frequency antenna conductor can be lowered, and high-density plasma with a low electron temperature can be efficiently generated.

主权项

1. A plasma generation device, comprising:
a) a vacuum container; b) an opening formed in a wall of the vacuum container; and c) a plate-shaped conductor being an inductive coupling radio-frequency antenna attached to the container so as to hermetically cover the opening.