Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank

摘要

The present invention relates to a reflective mask blank containing in this order, a substrate, a multilayer reflective film that reflects exposure light, and an absorber layer that absorbs the exposure light, in which the reflective mask blank further contains a fiducial mark indicating a reference position of the multilayer reflective film, which is formed in a concave shape or in a convex shape on a surface of the multilayer reflective film or on a surface of one layer formed between the multilayer reflective film and the absorber layer, and the fiducial mark is formed so as to have a reflectivity different from an area surrounding the fiducial mark with respect to a light with a prescribed wavelength and is transferred to a layer formed on the fiducial mark.

主权项

1. A reflective mask blank, comprising:
a substrate; a multilayer reflective film formed on the substrate and configured to reflect exposure light; and an absorber layer formed on the multilayer film and configured to absorb the exposure light, wherein the multilayer reflective film has a concave structure forming a fiducial mark indicating a reference position of the multilayer reflective film, and the concave structure is formed on a surface of the multilayer reflective film such that the concave structure has a concaved surface of a multilayer reflective portion of the multilayer reflective film and that a reflectivity of the concaved surface of the multilayer reflective film is different from an area surrounding the concave structure with respect to a light with a prescribed wavelength.