| 主权项 |
1. A method for producing an integrated device including an MIM capacitor, the method including the steps acts of:
providing a functional substrate including functional circuits of the integrated device, forming a first conductive layer including a first plate of the capacitor on the functional substrate, the first plate having a first melting temperature, depositing a layer of insulating material including a dielectric layer of the capacitor on a portion of the first conductive layer corresponding to the first plate, the layer of insulating material being deposited at a process temperature being greater than approximately 400° C. and lower than the first melting temperature, forming a second conductive layer including a second plate of the capacitor on a portion of the layer of insulating material corresponding to the dielectric layer, wherein the first melting temperature is higher than 500° C., and wherein the second conductive layer further includes functional connections to the functional circuits, the method further including the steps of:
forming a protective layer of insulating material covering the second plate and the functional connections;forming a first contact for contacting the first plate through the functional protective layer; andforming a second contact and functional contacts for contacting the second plate and the functional connections, respectively, through the protective layer. |
