发明名称 Method of manufacturing a display device comprising first and second polarizing plate and phase difference plate combinations and a step of simultaneously polishing a second substrate and a semiconductor chip to have the same thickness as each other
摘要 A display device including: a first substrate with a pixel switch and drivers mounted thereon; a second substrate disposed in facing relation to the first substrate; a material layer held between the first substrate and the second substrate and having peripheral edges sealed by a seal member, the material layer having an electrooptical effect; and a semiconductor chip mounted as a COG component on the first substrate, the semiconductor chip having a control system configured to control the drivers; wherein the semiconductor chip having a thickness equal to the total thickness of the seal member and the second substrate or larger than the thickness of the seal member and smaller than the total thickness.
申请公布号 US8917372(B2) 申请公布日期 2014.12.23
申请号 US201414295627 申请日期 2014.06.04
申请人 Japan Display West Inc. 发明人 Ino Masumitsu
分类号 G02F1/1345;G02F1/13;H01J9/20 主分类号 G02F1/1345
代理机构 Dentons US LLP 代理人 Dentons US LLP
主权项 1. A method of manufacturing a display device having a first substrate with a pixel switch and drivers mounted thereon, a second substrate disposed in facing relation to said first substrate, a material layer between said first substrate and said second substrate, a first polarizing plate and phase difference plate combination disposed between said first substrate and said material layer, a second polarizing plate and phase difference plate combination disposed between said second substrate and said material layer, and a seal member sealing said material layer, the method comprising: a first step of mounting a semiconductor chip having a control system configured to control said drivers, as a COG component on said first substrate parallel to a region in which said seal member and said second substrate are stacked; a second step of filling a space around said semiconductor chip with a protective fixing member thereby to secure said first substrate and said semiconductor chip to each other; and a third step of simultaneously polishing said second substrate and said semiconductor chip to the same thickness as each other.
地址 Aichi JP