Nanoimprint lithography formation of functional nanoparticles using dual release layers

摘要

Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.

主权项

1. An imprint lithography method for forming nanoparticles comprising:
forming a multilayer substrate comprising a base layer, a first removable layer bonded to the base layer, one or more functional layers bonded to the first removable layer; and a second removable layer bonded to one of the functional layers, wherein at least one of the one or more functional layers contains a functional material; forming a patterned layer on a surface of the multilayer substrate in an imprint lithography process, the patterned layer comprising a multiplicity of projections and recessions; transferring the features of the patterned layer into the multilayer substrate in one or more etching processes to form a plurality of multilayer pillars extending from the base layer; dissolving the first and second removable layers with a solvent to separate pillars containing the one or more functional layers from the base layer, the separated pillars defining nanoparticles.