Multiplexing EUV sources in reticle inspection

摘要

The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.

主权项

1. An illumination system, comprising:
a base member rotatable about a rotation axis; a first plurality of mirrors, each mirror of said first plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member and oriented at a predetermined angle; a first illumination source; and a second illumination source, wherein a mirror of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of the mirror at a first time, the mirror is further configured to reflect the radiation to an optical path, the mirror is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time, the mirror further configured to reflect the radiation to the optical path, the first portion being different from the second portion.