Illumination system for use in a stereolithography apparatus

摘要

The present invention relates to an illumination system for use in a stereolithography apparatus. The illumination system includes a plurality of light-emitting diodes (LEDs), each LED having at least a first light-emitting surface and a second surface, at least one of the first and the second surface being substantially flat. The illumination further includes a plurality of electrical pathways, selectively connected to the respective LEDs, such that each LED can be individually controlled and a leveling surface. The leveling surface is substantially flat and in leveling contact with the at least one substantially flat surface of each LED, such that a two-dimensional array of LEDs extends in a plane parallel to the leveling surface.

主权项

1. An illumination system, comprising:
a plurality of light-emitting diodes (LEDs), each LED having at least a first, light-emitting surface and a second surface, at least one of the first and the second surface being substantially flat; a plurality of electrical pathways, selectively connected to the respective LEDs, such that each LED can be individually controlled; and a leveling surface, wherein the leveling surface is substantially flat and in leveling contact with the at least one substantially flat surface of each LED, such that a two-dimensional array of LEDs extends in a plane parallel to the leveling surface, wherein the leveling surface is provided by a substantially rigid support body, wherein a surface of the support body is provided with slots, defined by intermediate ribs comprising flat top surfaces, in which the electrical pathways are at least partially embedded in the slots, wherein the leveling surface is provided by the flat top surfaces of the intermediate ribs, the flat top surfaces being free of said electrical pathways, and the LEDs are disposed with the at least one substantially flat surface on the flat top surfaces such as to be in mechanical and thermal contact with the support body.