| 摘要 |
<p>A liquid processing apparatus having substrate support parts restrains a large size and restrains the load of a pipe which supplies a processing liquid to a nozzle. The apparatus comprises substrate support parts which are arranged in the left and right directions and horizontally support substrates, respectively, a moving part which is separated from the column of the substrate support part in the front and back directions and moves in the left and right directions, a nozzle standby part which is installed in the moving line of the moving part with regard to the column of the substrate support part and holds a nozzle of supplying a process liquid to a substrate supported by the substrate support part, and a rotation arm which has one end part at which a nozzle support part of detachably supporting the nozzle is installed and the other end part at which the moving part is horizontally rotated to transfer the nozzle by cooperating with the moving part between the nozzle standby part and a supply position for supplying the process liquid to the substrate.</p> |
