摘要 |
<p>The present invention relates to a substrate processing apparatus, which enables a worker to check a target object alignment state within a chamber, including a first light source generating a first emitted light; an optical device guiding the first emitted light in a direction of the target object; the chamber having a light transmitting member which passes the first emitted light to make the external first emitted light arrive at the internal target object; and a camera photographing a detected light having passed through the optical device by reflecting the first emitted light, having passed through the light transmitting member, from the target object in the direction of the light transmitting member, wherein the light transmitting member may be installed to make its incidence side tilt with respect to a plane being vertical to a progress direction of the first emitted light.</p> |