发明名称 APPARATUS FOR TREATING SUBSTRATE
摘要 <p>An embodiment of the present invention provides a device which processes a substrate with a liquid and a method thereof. A substrate processing device comprises; a housing which provides a processing space in the inner side; a spin head which is located in the housing and supports and rotates the substrate; and a spraying unit which sprays a liquid medicine to the substrate which is supported on the spin head. The spraying unit comprises; a first nozzle member which sprays the liquid medicine to the substrate; and a second nozzle member which sprays the liquid medicine to the substrate. The second nozzle member comprises a nozzle having a body wherein a longitudinal direction is parallel to the spin head. The first nozzle member forms a liquid film on the substrate while a slit nozzle is moved to a processing position. Therefore, it is prevented that the substrate is dried.</p>
申请公布号 KR20140144800(A) 申请公布日期 2014.12.22
申请号 KR20130066630 申请日期 2013.06.11
申请人 SEMES CO., LTD. 发明人 JEONG, YOUNG JU
分类号 H01L21/302 主分类号 H01L21/302
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