发明名称 LASER MARKING METHOD AND LASER MARKING SYSTEM
摘要 FIELD: physics, optics.SUBSTANCE: invention relates to a method for laser marking a substrate having a portion which is sensitive to laser radiation emitted by a laser. Said portion which is sensitive to laser radiation can be activated at a threshold energy level. The method comprises steps of: activating said portion which is sensitive to laser radiation using an activating element which irradiates the whole portion which is sensitive to laser radiation, and irradiating a portion of said portion which is sensitive to laser radiation using said laser, wherein the activating element is configured such that the emitted radiation is concentrated at a certain wavelength and wherein overall irradiation results in transmission of energy of said threshold level. The portion which is sensitive to laser radiation is activated in that portion where overall irradiation occurs. The invention also relates to a laser marking system for carrying out said method.EFFECT: present invention provides high-speed and high-resolution marking.14 cl, 2 dwg
申请公布号 RU2536031(C2) 申请公布日期 2014.12.20
申请号 RU20120116077 申请日期 2010.09.23
申请人 TETRA LAVAL' KHOLDINGZ EHND FAJNEHNS S.A. 发明人 SHOURVARZI ABOLGKHASEM;BER'ESSON SESILIJA
分类号 B41M5/26;B41J2/44 主分类号 B41M5/26
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