| 摘要 |
A method for generating a mask pattern used for lithographic equipment through computation by a processor, comprises the steps of: applying, to a target primary pattern, a reference map of an image characteristic value of a representative primary pattern with respect to a position of a representative auxiliary pattern which is computed for each of a plurality of positions while the position of the representative auxiliary pattern is changed with respect to the representative primary pattern, and computing a map of an image characteristic value of the target primary pattern with respect to a position of the auxiliary pattern; and determining a position of the auxiliary pattern by using data of the map of image characteristic value of the target primary pattern, and generating a mask pattern including the target primary pattern and the determined auxiliary pattern. |
