REACTION DEVICE AND MANUFACTURE METHOD FOR CHEMICAL VAPOR DEPOSITION

摘要

A reaction device for chemical vapor deposition is disclosed. The reaction device includes a chamber, a susceptor, an inlet pipe unit and an outlet pipe. The susceptor is disposed within the chamber. The inlet pipe unit includes a plurality of feeding openings horizontally facing the peripheral area of the susceptor to input at least one reaction gas into the chamber. The at least one reaction gas is guided to move from the peripheral area of the susceptor and along a surface of the susceptor to reach the center of the susceptor. The outlet pipe includes a discharge opening whose position is corresponding to the center of the susceptor so as to discharge the reaction gas flowing to the center of the susceptor out of the chamber.

主权项

1. A reaction device for chemical vapor deposition, comprising:
a chamber; a susceptor disposed within the chamber; an inlet pipe unit comprising at least one feeding opening horizontally facing a peripheral area of the susceptor to input at least one reaction gas into the chamber, wherein the at least one reaction gas is guided to move from the peripheral area of the susceptor and along a surface of the susceptor to reach a center of the susceptor; and an outlet pipe comprising a discharge opening whose position is corresponding to the center of the susceptor so as to discharge the reaction gas flowing to the center of the susceptor out of the chamber.