发明名称 ABSORBER LAYER FOR A THIN FILM PHOTOVOLTAIC DEVICE WITH A DOUBLE-GRADED BAND GAP
摘要 A gallium-containing alloy is formed on the light-receiving surface of a CIGS absorber layer, and, in conjunction with a subsequent selenization or anneal process, is converted to a gallium-rich region at the light-receiving surface of the CIGS absorber layer. A second gallium-rich region is formed at the back contact surface of the CIGS absorber layer during selenization, so that the CIGS absorber layer has a double-graded gallium concentration that increases toward the light-receiving surface and toward the back contact surface of the CIGS absorber layer. The double-graded gallium concentration advantageously produces a double-graded bandgap profile for the CIGS absorber layer.
申请公布号 US2014370646(A1) 申请公布日期 2014.12.18
申请号 US201414477392 申请日期 2014.09.04
申请人 Intermolecular, Inc. 发明人 Liang Haifan
分类号 H01L31/18 主分类号 H01L31/18
代理机构 代理人
主权项 1. A method of forming a thin-film solar cell absorber layer, the absorber layer having a first surface that is light receiving, the method comprising: forming a first layer on a substrate, wherein the first layer comprises copper, indium, gallium, and selenium and includes a gallium-rich region; forming a second layer above the first layer via thermal pyrolysis of trimethyl gallium (TMGa), wherein the second layer comprises gallium; and exposing the second layer to heat and a selenium-containing gas to convert the second layer to a third layer that comprises gallium and selenium.
地址 San Jose CA US