发明名称 METHODS OF FORMING THREE-DIMENSIONALLY INTEGRATED SEMICONDUCTOR SYSTEMS INCLUDING PHOTOACTIVE DEVICES AND SEMICONDUCTOR-ON-INSULATOR SUBSTRATES
摘要 Three-dimensionally integrated semiconductor systems include a photoactive device operationally coupled with a current/voltage converter on a semiconductor-on-insulator (SeOI) substrate. An optical interconnect is operatively coupled to the photoactive device. A semiconductor device is bonded over the SeOI substrate, and an electrical pathway extends between the current/voltage converter and the semiconductor device bonded over the SeOI substrate. Methods of forming such systems include forming a photoactive device on an SeOI substrate, and operatively coupling a waveguide with the photoactive device. A current/voltage converter may be formed over the SeOI substrate, and the photoactive device and the current/voltage converter may be operatively coupled with one another. A semiconductor device may be bonded over the SeOI substrate and operatively coupled with the current/voltage converter.
申请公布号 US2014369646(A1) 申请公布日期 2014.12.18
申请号 US201414474503 申请日期 2014.09.02
申请人 SOITEC 发明人 Nguyen Bich-Yen;Sadaka Mariam
分类号 H01L25/16;H01L33/34;G02B6/12;H01L27/12 主分类号 H01L25/16
代理机构 代理人
主权项 1. A three-dimensionally integrated semiconductor system, comprising: a semiconductor-on-insulator (SeOI) substrate comprising: a layer of semiconductor material; anda layer of electrically insulating material disposed adjacent a major surface of the layer of semiconductor material; at least one photoactive device formed on the layer of semiconductor material of the SeOI substrate; and at least one optical interconnect comprising a portion of the layer of semiconductor material of the SeOI substrate, the at least one optical interconnect operatively coupled to the at least one photoactive device; at least one current/voltage converter formed over the layer of semiconductor material of the SeOI substrate; at least one electrical pathway extending between the at least one photoactive device and the at least one current/voltage converter; at least one semiconductor device bonded over the SeOI substrate; and at least one electrical pathway extending between the at least one current/voltage converter and the at least one semiconductor device bonded over the SeOI substrate.
地址 Crolles Cedex FR