发明名称 METHOD FOR TRANSFERRING SUBSTRATES AND SUBSTRATE PROCESS APPARATUS
摘要 <p>The present invention relates to a substrate transferring method and a substrate processing apparatus. The substrate processing apparatus comprises a load lock chamber; a transfer chamber arranged on one side of the load lock chamber; a first process chamber arranged on one side of the transfer chamber to face the load lock chamber; multiple second process chambers arranged between the load lock chamber and the first process chamber on both sides of the transfer chamber to face each other, wherein the number of the second process chambers are two or more; and a substrate transferring robot arranged on the transfer chamber. The substrate transferring method is provided to transfer the substrate by using the transfer robot which includes a main rotary shaft rotating a robot body; a first arm having one end connected to the upper part of the main rotary shaft; a second arm having one end connected to the other end of the first arm; and a lower hand part and an upper hand part vertically stacked on the other end of the second arm to be connected to each other. The upper and lower hand parts of the substrate transferring robot individually rotate around a connection part with the second arm to transfer a processed substrate and a substrate to be processed, and therefore is capable of loading/unloading the substrates into/from the chambers by using one robot.</p>
申请公布号 KR20140144322(A) 申请公布日期 2014.12.18
申请号 KR20130066073 申请日期 2013.06.10
申请人 WONIK IPS CO., LTD. 发明人 JEON, KYUNG HEE;KO, DONG SUN;JEON, YONG BAEK
分类号 H01L21/677;B25J9/04;B65G49/06 主分类号 H01L21/677
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