| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a hydroxyphenyl (meth)acrylate (co)polymer which has good solubility in a solvent and shows sufficiently few defects when used in a semiconductor lithography solution, and a method for producing the same.SOLUTION: Provided is a (co)polymer which is produced by radical polymerization in a reactor with a reaction liquid temperature controlled between 70 to 100°C, and is used in a semiconductor lithography process. A peak area of a high polymer component, having a molecular weight five times as large as a weight average molecular weight (Mw) of the (co)polymer as measured by gel permeation chromatography (GPC), is 0.2% or less relative to the total peak area.</p> |
