发明名称 METAL-INSULATOR-METAL CAPACITOR STRUCTURES
摘要 <p>Capacitor structures capable of providing both low-voltage capacitors and high-voltage capacitors are described herein. In one embodiment, a capacitor structure comprises a low-voltage capacitor and a high-voltage capacitor. The low-voltage capacitor comprises a first electrode formed from a first metal layer, a second electrode formed from a second metal layer, a third electrode formed from a third metal layer, a first dielectric layer between the first and second electrodes, and a second dielectric layer between the second and third electrodes. The high-voltage capacitor comprises a fourth electrode formed from the first metal layer, a fifth electrode formed from the third metal layer, and a third dielectric layer between the fourth and fifth electrodes, wherein the third dielectric layer is thicker than either the first dielectric layer or the second dielectric layer.</p>
申请公布号 WO2014201415(A1) 申请公布日期 2014.12.18
申请号 WO2014US42404 申请日期 2014.06.13
申请人 QUALCOMM INCORPORATED 发明人 JAKUSHOKAS, RENATAS;SRINIVAS, VAISHNAV;KIM, ROBERT WON CHOL
分类号 H01L49/02;H01L23/522;H01L27/08 主分类号 H01L49/02
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