发明名称 |
PATTERNED MATERIALS AND METHODS OF MAKING THEM |
摘要 |
<p>A patterned material can be prepared from a patterned material precursor having an elastomeric relief image-forming layer. The formed relief image comprises uppermost surfaces and relief recesses such as recess walls and recess floors. The patterned material also has a layer disposed on either a portion or the entire surface of the relief image in the elastomeric layer. This layer includes a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane. The reaction product is formed by applying a reactive composition of the noted components over the entire relief image in the patterned material precursor, following by drying and curing.</p> |
申请公布号 |
WO2014200702(A1) |
申请公布日期 |
2014.12.18 |
申请号 |
WO2014US39949 |
申请日期 |
2014.05.29 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
TRIA, MARIA CELESTE RELLAMAS;LANDRY-COLTRAIN, CHRISTINE JOANNE |
分类号 |
G07F7/00;B29C33/40;G03F7/16;G03F7/20 |
主分类号 |
G07F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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