发明名称 PATTERNED MATERIALS AND METHODS OF MAKING THEM
摘要 <p>A patterned material can be prepared from a patterned material precursor having an elastomeric relief image-forming layer. The formed relief image comprises uppermost surfaces and relief recesses such as recess walls and recess floors. The patterned material also has a layer disposed on either a portion or the entire surface of the relief image in the elastomeric layer. This layer includes a reaction product of a non-fluorinated metal oxide precursor and a hydrolyzable fluoroalkylsilane. The reaction product is formed by applying a reactive composition of the noted components over the entire relief image in the patterned material precursor, following by drying and curing.</p>
申请公布号 WO2014200702(A1) 申请公布日期 2014.12.18
申请号 WO2014US39949 申请日期 2014.05.29
申请人 EASTMAN KODAK COMPANY 发明人 TRIA, MARIA CELESTE RELLAMAS;LANDRY-COLTRAIN, CHRISTINE JOANNE
分类号 G07F7/00;B29C33/40;G03F7/16;G03F7/20 主分类号 G07F7/00
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