| 摘要 |
A method for a multi charged particle beam lithography includes: converting, for each shot of beams, a gray scale value, which is obtained by dividing an individual irradiation time period of the each beam of a multi beam by a charged particle beam in a quantization unit, into binary data having a predetermined number of digits; dividing a maximum irradiation time per shot of the beam into a plurality of first irradiation time periods, each of which is calculated by multiplying a gray scale values defined in decimal numbers converted from each digit value of data of binary numbers of the predetermined digit number; dividing a plurality of second irradiation time periods, which are a part of the plurality of first irradiation time periods into a plurality of third irradiation time periods; dividing, for each shot of beams, irradiation of the corresponding beam into each irradiation step of a plurality of third irradiation time periods and each irradiation step of the first irradiation time periods, which is not divided, by using the remaining first irradiation time periods, which are not divided into the third irradiation time periods; irradiating, for each group of a plurality of groups in the each shot of beams, a target object, in order, with the multiple charged particle beams such that the plurality of groups, which are respectively composed of combination of at least two irradiation steps, continue in order. |
