发明名称 ELECTRON BEAM APPARATUS
摘要 <p>According to an embodiment of the present invention, an electron beam device includes multiple electron beam columns which include an electron optical system emitting an electron beam to the surface of a sample, and a detecting system detecting an electron generated by emitting the electron beam, inside the housing. Each electron beam column includes an object lens, which is an electrostatic lens. The object lens can include a first electrode of which parts are consecutively applied with negative voltage in order, from the side facing the sample; a second electrode connected to the ground; a third electrode applied with focus voltage; and a fourth electrode connected to the ground.</p>
申请公布号 KR20140144129(A) 申请公布日期 2014.12.18
申请号 KR20140012678 申请日期 2014.02.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OGAWA TAKASHI;USAMI YASUTSUGU;TOGASHI MITSUHIRO
分类号 G01N23/225;H01J37/26 主分类号 G01N23/225
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