发明名称 GAS BARRIER FILM, ELEMENT DEVICE AND METHOD OF PRODUCING GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film which has sufficient gas barrier properties even in a high-temperature, high-humidity service environment, is suppressed in deterioration of gas barrier properties even when the film is bent and also is excellent in crack resistance.SOLUTION: A gas barrier film 1a has a gas barrier layer 3 containing silicon and oxygen on at least one side of a substrate 1. In the oxygen distribution curve based on element distribution measurement of the gas barrier layer 3 in the depth direction by X-ray photoelectron spectroscopy, a peak of the oxygen distribution curve closest to the surface of the gas barrier layer 3 on the side of the substrate 1 is the largest value among maximum values of the oxygen distribution curves in the gas barrier layer 3.
申请公布号 JP2014237317(A) 申请公布日期 2014.12.18
申请号 JP20140126048 申请日期 2014.06.19
申请人 KONICA MINOLTA INC 发明人 NISHIO SHOJI
分类号 B32B9/00;C23C16/42;C23C16/54 主分类号 B32B9/00
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