Performing Atomic Layer Deposition on Large Substrate Using Scanning Reactors

摘要

Embodiments relate to a deposition device for depositing one or more layers of material on a substrate using scanning modules that move across the substrate in a chamber filled with reactant precursor. The substrate remains stationary during the process of depositing the one or more layers of material. A chamber enclosing the substrate is filled with reactant precursor to expose the substrate to the reactant precursor. As the scanning modules move across the substrate, the scanning modules remove the reactant precursor in their path and/or revert the reactant precursor to an inactive state. The scanning modules also inject source precursor onto the substrate as the scanning modules move across the substrate.

主权项

1. An apparatus for depositing material on a substrate, comprising:
a susceptor configured to secure one or more substrates; a stationary injector configured to inject a first precursor onto the one or more substrates; a scanning module configured to move across space between the stationary injector and the one or more substrates to inject a second precursor onto the one or more substrates; and an enclosure configured to enclose the susceptor and the scanning module.