| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device advantageous for transferring the pattern of a mask accurately onto a substrate.SOLUTION: An exposure device for exposing each of a plurality of shot regions on a substrate includes a substrate stage movable while holding the substrate, and a control unit. The plurality of shot regions include a first shot region, and a second shot region where exposure is performed next to the first shot region. During a period after ending exposure of the first shot region before starting exposure of the second shot region, the control unit drives the substrate stage according to drive information of the substrate stage, and if exposure conditions for performing exposure of the second shot region in the above-mentioned period, the control unit performs exposure of the second shot region after re-driving the substrate stage according to the drive information. |
