发明名称 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
摘要 A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
申请公布号 US2014368804(A1) 申请公布日期 2014.12.18
申请号 US201314374197 申请日期 2013.01.17
申请人 ASML Netherlands B.V. 发明人 Lafarre Raymond Wilhelmus Louis;Donders Sjoerd Nicolaas Lambertus;Ten Kate Nicolaas;Dziomkina Nina Vladimirovna;Karade Yogesh Pramod;Rodenburg Elisabeth Corinne
分类号 G03F7/20;B23Q3/18 主分类号 G03F7/20
代理机构 代理人
主权项 1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising: a main body having a smooth and flat surface; a thin-film stack provided on the surface and forming an electric component; and a plurality of burls provided on the thin-film stack and having end surfaces to support a substrate, wherein the main body is formed of a different material than the burls.
地址 Veldhoven NL