发明名称 |
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER |
摘要 |
A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack. |
申请公布号 |
US2014368804(A1) |
申请公布日期 |
2014.12.18 |
申请号 |
US201314374197 |
申请日期 |
2013.01.17 |
申请人 |
ASML Netherlands B.V. |
发明人 |
Lafarre Raymond Wilhelmus Louis;Donders Sjoerd Nicolaas Lambertus;Ten Kate Nicolaas;Dziomkina Nina Vladimirovna;Karade Yogesh Pramod;Rodenburg Elisabeth Corinne |
分类号 |
G03F7/20;B23Q3/18 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate holder for use in a lithographic apparatus, the substrate holder comprising:
a main body having a smooth and flat surface; a thin-film stack provided on the surface and forming an electric component; and a plurality of burls provided on the thin-film stack and having end surfaces to support a substrate, wherein the main body is formed of a different material than the burls. |
地址 |
Veldhoven NL |