发明名称 |
ON-AXIS FOCUS SENSOR AND METHOD |
摘要 |
A focus height sensor in an optical system for inspection of semiconductor devices includes a sensor beam source that emits a beam of electromagnetic radiation. A reflector receives the beam of electromagnetic radiation from the sensor beam source and directs the beam toward a surface of a semiconductor device positioned within a field of view of the optical system. The reflector is positioned to receive at least a portion of the beam back from the surface of the semiconductor device to direct the returned beam to a sensor. The sensor receives the returned beam and outputs a signal correlating to a position of the surface within the field of view along an optical axis of the optical system. |
申请公布号 |
US2014368635(A1) |
申请公布日期 |
2014.12.18 |
申请号 |
US201214367564 |
申请日期 |
2012.12.20 |
申请人 |
Rudolph Technologies, Inc. |
发明人 |
Ohren Dennis L.;Voges Christopher J.;Rotering Andrew E. |
分类号 |
G02B7/28;G01N21/84;H04N5/232;G01B11/06 |
主分类号 |
G02B7/28 |
代理机构 |
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代理人 |
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主权项 |
1. In an optical system for inspection of semiconductor devices, a focus height sensor comprising:
a sensor beam source that emits a beam of electromagnetic radiation; a reflector for receiving the beam of electromagnetic radiation from the sensor beam source and directing said beam toward a surface of a semiconductor device that is positioned within a field of view of the optical system, the reflector also being positioned to receive at least a portion of said beam back from the surface of the semiconductor device to direct the returned beam to a sensor; and, the sensor receiving the returned beam and outputting a signal correlating to a position of the surface within the field of view along an optical axis of the optical system. |
地址 |
Flanders NJ US |