发明名称 ON-AXIS FOCUS SENSOR AND METHOD
摘要 A focus height sensor in an optical system for inspection of semiconductor devices includes a sensor beam source that emits a beam of electromagnetic radiation. A reflector receives the beam of electromagnetic radiation from the sensor beam source and directs the beam toward a surface of a semiconductor device positioned within a field of view of the optical system. The reflector is positioned to receive at least a portion of the beam back from the surface of the semiconductor device to direct the returned beam to a sensor. The sensor receives the returned beam and outputs a signal correlating to a position of the surface within the field of view along an optical axis of the optical system.
申请公布号 US2014368635(A1) 申请公布日期 2014.12.18
申请号 US201214367564 申请日期 2012.12.20
申请人 Rudolph Technologies, Inc. 发明人 Ohren Dennis L.;Voges Christopher J.;Rotering Andrew E.
分类号 G02B7/28;G01N21/84;H04N5/232;G01B11/06 主分类号 G02B7/28
代理机构 代理人
主权项 1. In an optical system for inspection of semiconductor devices, a focus height sensor comprising: a sensor beam source that emits a beam of electromagnetic radiation; a reflector for receiving the beam of electromagnetic radiation from the sensor beam source and directing said beam toward a surface of a semiconductor device that is positioned within a field of view of the optical system, the reflector also being positioned to receive at least a portion of said beam back from the surface of the semiconductor device to direct the returned beam to a sensor; and, the sensor receiving the returned beam and outputting a signal correlating to a position of the surface within the field of view along an optical axis of the optical system.
地址 Flanders NJ US