发明名称 |
PERFORMING ATOMIC LAYER DEPOSITION ON LARGE SUBSTRATE USING SCANNING REACTORS |
摘要 |
<p>Embodiments relate to a deposition device for depositing one or more layers of material on a substrate using scanning modules that move across the substrate in a chamber filled with reactant precursor. The substrate remains stationary during the process of depositing the one or more layers of material. A chamber enclosing the substrate is filled with reactant precursor to expose the substrate to the reactant precursor. As the scanning modules move across the substrate, the scanning modules remove the reactant precursor in their path and/or revert the reactant precursor to an inactive state. The scanning modules also inject source precursor onto the substrate as the scanning modules move across the substrate.</p> |
申请公布号 |
WO2014200815(A1) |
申请公布日期 |
2014.12.18 |
申请号 |
WO2014US41132 |
申请日期 |
2014.06.05 |
申请人 |
VEECO ALD INC. |
发明人 |
PAK, SAMUEL, S.;YANG, HYOSEOK;LEE, SANG, IN |
分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|