发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF RESIN PATTERN, CURED PRODUCT, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENCE (EL) DISPLAY DEVICE, AND TOUCH PANEL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which excels in transparency of a cured product obtained therefrom and in adhesiveness after developed, and to provide a production method of a resin pattern using the photosensitive resin composition, a cured product and a cured film obtained by curing the photosensitive resin composition, and a liquid crystal display device, an organic EL display device and a touch panel device having the cured film.SOLUTION: The photosensitive resin composition comprises (component A) metal oxide particles, (component B) a solvent, (component C) a polymer containing a structural unit having a group in which an acid group is protected by an acid decomposable group, (component D) a photoacid generator, and (component S) a compound having a single sulfide bond and two or more moiety structures expressed by formula (1) in the molecule. In the formula, Rand Reach independently represent a hydrogen atom or an alkyl group; n represents an integer of 1 to 3; and a wavy line represents a bonding position with other structures.
申请公布号 JP2014238438(A) 申请公布日期 2014.12.18
申请号 JP20130119649 申请日期 2013.06.06
申请人 FUJIFILM CORP 发明人 KASHIWAGI DAISUKE;FUJIMOTO SHINJI;YAMASHITA SHIE
分类号 G03F7/075;C08F20/26;G02F1/1333;G03F7/004;G03F7/039;G06F3/041;H01L21/027;H01L51/50;H05B33/10;H05B33/12;H05B33/22 主分类号 G03F7/075
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