| 发明名称 |
PARTICLE REDUCTION VIA THROTTLE GATE VALVE PURGE |
| 摘要 |
Methods and apparatus for particle reduction in throttle gate valves used in substrate process chambers are provided herein. In some embodiments, a gate valve for use in a process chamber includes a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening. |
| 申请公布号 |
US2014366953(A1) |
申请公布日期 |
2014.12.18 |
| 申请号 |
US201414276289 |
申请日期 |
2014.05.13 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LEE JARED AHMAD;LUBOMIRSKY DMITRY;SALINAS MARTIN JEFF;NGUYEN ANDREW;CHO TOM K.;ENGLHARDT ERIC A.;SILVEIRA FERNANDO |
| 分类号 |
F16K3/02;B08B9/032 |
主分类号 |
F16K3/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A gate valve for use in a process chamber, comprising:
a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening. |
| 地址 |
Santa Clara CA US |
