发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A semiconductor device forms a salicide layer to surround an upper surface and a circumference of a lateral surface of a pillar. A contact area between the pillar and a lower electrode may be increased to reduce a contact resistance. |
申请公布号 |
US2014367769(A1) |
申请公布日期 |
2014.12.18 |
申请号 |
US201314044475 |
申请日期 |
2013.10.02 |
申请人 |
SK hynix Inc. |
发明人 |
KIM Suk Ki;CHOI Kang Sik |
分类号 |
H01L29/78;H01L29/06;H01L29/66 |
主分类号 |
H01L29/78 |
代理机构 |
|
代理人 |
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主权项 |
1. A semiconductor device, comprising:
a semiconductor substrate; a plurality of pillars formed to extend substantially perpendicular from the semiconductor substrate; a gate electrode formed to surround a circumference of a lower portion of a lateral surface of each of the pillars and to have an upper surface having a height lower than a height of an upper surface of each of the pillars; a salicide layer formed to surround the upper surface of each of the pillars and a circumference of an upper portion of the lateral surface of each of the pillars; a lower electrode formed to surround an upper surface and a lateral surface of the salicide layer; and a first spacer formed to surround a portion of the lateral surface of each of the pillars, between the upper surface of the gate electrode and the salicide layer. |
地址 |
Gyeonggi-do KR |