发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor device forms a salicide layer to surround an upper surface and a circumference of a lateral surface of a pillar. A contact area between the pillar and a lower electrode may be increased to reduce a contact resistance.
申请公布号 US2014367769(A1) 申请公布日期 2014.12.18
申请号 US201314044475 申请日期 2013.10.02
申请人 SK hynix Inc. 发明人 KIM Suk Ki;CHOI Kang Sik
分类号 H01L29/78;H01L29/06;H01L29/66 主分类号 H01L29/78
代理机构 代理人
主权项 1. A semiconductor device, comprising: a semiconductor substrate; a plurality of pillars formed to extend substantially perpendicular from the semiconductor substrate; a gate electrode formed to surround a circumference of a lower portion of a lateral surface of each of the pillars and to have an upper surface having a height lower than a height of an upper surface of each of the pillars; a salicide layer formed to surround the upper surface of each of the pillars and a circumference of an upper portion of the lateral surface of each of the pillars; a lower electrode formed to surround an upper surface and a lateral surface of the salicide layer; and a first spacer formed to surround a portion of the lateral surface of each of the pillars, between the upper surface of the gate electrode and the salicide layer.
地址 Gyeonggi-do KR