| 摘要 |
A wavefront is measured with superior precision even if the density of scatterers in the vicinity of a focal plane is low. Provided is a wavefront measurement method including a contrast measuring step of measuring the contrast of an interference pattern corresponding to each part of a specimen containing a scatterer, generated by interfering reference light and return light from a focal plane in the specimen; a region extracting step of extracting a high-contrast region in which the contrast measured in the contrast measuring step is greater than or equal to a prescribed threshold; and a wavefront calculating step of converting an interference pattern corresponding to the high-contrast region to wavefront data, for the high-contrast region extracted in the region extracting step. |
